Polymer composition having high resistance to photo deterioration

  • Inventors:
  • Assignees: Goodrich Co B F
  • Publication Date: December 04, 1979
  • Publication Number: JP-S54153850-A

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Cited By (3)

    Publication numberPublication dateAssigneeTitle
    JP-H01275651-ANovember 06, 1989Toray Ind IncPolyacetal resin composition
    JP-H0465862-B2October 21, 1992Asahi Chemical Ind
    JP-S60195155-AOctober 03, 1985Asahi Chem Ind Co LtdPolyoxymethylene composition